High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• that relatively large areas can be decorated with nanostructured devices via IBL by using multipurpose SEM/FIB instruments with potential applications in FEL focusing, extreme UV and soft X-ray lithography and as wavefront sensing devices for beam diagnostics. Keywords: extreme ultraviolet (EUV

• ) radiation; focused ion beam (FIB); Fresnel zone plate; ion beam lithography (IBL); nanopatterning; soft X-rays; Introduction Requirements for focusing elements that work at extreme ultraviolet (EUV) and soft X-ray (SXR) energies are very different from those of the more familiar ultraviolet, visible or